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Mattson Technology, Inc. Mattson Technology’s Plasma Etch Products Delivering Unique Plasma Source Technology Over 100 ICP Etch Systems in High Volume Production Leader in Dry Strip Market and Surface Cleaning Industry Benchmark in Photoresist Removal Purest High Density Radical Source Millios Most Flexible Millisecond Anneal Silicidation Tool
Company Overview - Mattson Technology, Inc. Mattson Technology, Inc designs, manufactures, markets and globally supports semiconductor wafer processing equipment used in the fabrication of integrated circuits We are a key supplier of plasma and rapid thermal processing equipment to the global semiconductor industry
Mattson Technology Locations Mattson International GmbH Manfred-von-Ardenne-Ring 20 01099 Dresden, Germany Taiwan Hsin Chu, Taiwan Sales and Service Office 3F-5, No 101, Sec 2 Gongdaowu Road Hsinchu City 30070 TAIWAN Tel: +886-3-571-3355 Taichung, Taiwan Sales and Service Office 6F, No 1151 Zhongping Rd
Technology - Mattson Technology, Inc. OVERVIEW We design and manufacture wafer processing equipment used in the fabrication of integrated circuits (ICs) Our manufacturing equipment utilizes innovative technologies to deliver advanced processing capabilities and high productivity for the fabrication of current- and next-generation ICs in the following product sectors: Dry Strip, Plasma Etch, Surface Treatment and Ultra-Selective
Rapid Thermal Processing - Mattson Technology, Inc. RTP refers to a process that heats silicon wafers to high temperatures (up to 1200°C or greater) using high intensity lamps to set the electrical properties of the semiconductor devices Our thermal products now include a wide range of rapid anneals ranging from soak to spike to millisecond flash Our Helios family RTP systems offer…Read More »
Dry Strip - Mattson Technology, Inc. Dry strip is the removal of the masking layers from the wafer after the patterning process has been completed The objective is to eliminate the masking material from the wafer as quickly as possible, without allowing any surface materials to become damaged We are a leader in the dry strip market Our strip systems offer…Read More »
Aspen - Mattson Technology, Inc. Alpine® Alpine is a cost effective, technology platform for both advanced plasma strip and semi-critical etch applications Based on proprietary Faraday shield inductively coupled plasma (ICP) source design, Alpine incorporates an electrostatic chuck with bias capability to provide independent control of ion energy and ion density
Surface Treatment and Ultra-Selective Materials Removal - Mattson . . . Based on an industry leading remote plasma technology, Mattson Technology’s Novyka® family selective etch systems offer unique process solutions and deliver outstanding results in isotropic and anisotropic etch of various dielectric and conductor materials
Management Team - Mattson Technology, Inc. Dr Schubert Chu is Chief Product Officer of Mattson Technology, responsible for leading the Company’s product strategy, development and support Dr Chu joined Mattson Technology in January 2021 Dr Chu has an extensive track record in the semiconductor industry directing product teams and driving market share growth