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Mattson Technology, Inc. Mattson Technology’s Plasma Etch Products Delivering Unique Plasma Source Technology Over 100 ICP Etch Systems in High Volume Production Most Flexible Millisecond Anneal Silicidation Tool
Company Overview - Mattson Technology, Inc. Mattson Technology was founded in 1988 in Fremont, California After breaking into the semiconductor equipment industry as a leading supplier of dry strip equipment, we expanded our portfolio of processing equipment to also include plasma etch, rapid thermal anneal and millisecond anneal
Mattson Technology Locations Dornstadt, Germany Manufacturing Plant Daimlerstrasse 10 89160 Dornstadt, GERMANY Tel: +49- (0)-7348-981-0 Dresden, Germany Sales and Service Office Mattson International GmbH Manfred-von-Ardenne-Ring 20 01099 Dresden, Germany
Technology - Mattson Technology, Inc. Leading-edge wafer processing at high productivity levels providing customers with the most cost-effective manufacturing solution
Management Team - Mattson Technology, Inc. In that role, he advised Mattson and more than 30 other companies across a broad range of financial and operational matters He holds a Bachelor of Science in Accounting from the University of Florida and is a Certified Public Accountant (inactive) in the State of California
Careers Overview - Mattson Technology, Inc. Mattson Technology is a global company with nearly 30 years of experience delivering leading-edge technology and products in the Dry Strip, Plasma and Thermal markets to our customers
Plasma ETCH - Mattson Technology, Inc. Etching is the process of selectively removing mask patterned materials from the wafer’s surface to create desired patterns on the wafer’s surface Plasma etch is the use of a radio frequency (RF) excited plasma to produce chemically reactive species from various gases The reactive plasma is exposed to the wafer surface and etches away the…Read More »
Rapid Thermal Processing - Mattson Technology, Inc. RTP refers to a process that heats silicon wafers to high temperatures (up to 1200°C or greater) using high intensity lamps to set the electrical properties of the semiconductor devices Our thermal products now include a wide range of rapid anneals ranging from soak to spike to millisecond flash Our Helios family RTP systems offer unique double-side heating RTP technology It can achieve
Dry Strip - Mattson Technology, Inc. Dry strip is the removal of the masking layers from the wafer after the patterning process has been completed The objective is to eliminate the masking material from the wafer as quickly as possible, without allowing any surface materials to become damaged We are a leader in the dry strip market Our strip systems offer…Read More »