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Ambient Control Anneal System | Veeco The LSA201 targets applications such as high k metal gate junction activation and nickel silicide formation The LSA201 is well suited for processes at sub-20nm, such as interface engineering and material modification where ambient control is critical
Veeco LSA 201 Ambient Control Laser Spike Anneal System Veeco’s LSA201 Laser Spike Annealing (LSA) System has the same architecture as the LSA101 but includes a patented micro chamber design which enables full-wafer ambient control in a scanning laser system The micro chamber is unique in that it does not require the use of a vacuum load-lock
Veeco secures order for semiconductor annealing systems Laser spike annealing is a critical process in semiconductor manufacturing, activating dopants to reduce the resistance of transistor structures Veeco's LSA system achieves high-temperature
3D laser processing machine - Ultratech LSA 201 - VEECO Find out all of the information about the VEECO product: 3D laser processing machine Ultratech LSA 201 Contact a supplier or the parent company directly to get a quote or to find out a price or your closest point of sale
Veeco’s Laser Annealing Platform Wins Multi-System Orders and . . . PLAINVIEW, N Y — Veeco Instruments Inc (NASDAQ: VECO) announced today that multiple leading semiconductor manufacturers have placed repeat, multi-system orders for Veeco’s LSA101 and LSA201 Laser Annealing Systems
Secret semiconductor company places multi-system order with Veeco Veeco Instruments says that a leading-edge semiconductor company has placed an order for multiple laser annealing systems to accelerate the design and manufacturing of 2-nanometer gate-all-around logic semiconductor chips The order includes LSA201 Laser Spike Annealing Systems in addition to an NSA500 Nanosecond Annealing System
LSA 201 Ambient Control Laser Spike Anneal System The LSA201 targets applications such as high k metal gate junction activation and nickel silicide formation The LSA201 is well suited for processes at sub-20nm, such as interface engineering and material modification where ambient control is critical Key Features
Ultratech Ships First Sub-20-nm Ambient Control System SAN JOSE, Calif , June 20, 2013 — Lithography and laser-processing systems supplier Ultratech Inc has shipped its first LSA201 ambient control laser spike anneal system to an undisclosed company for the development of FinFET logic technology